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Inventi Impact: Chemical Engineering

Articles

  • Inventi:eche/32651/20
    Quartz Crystal Microbalances for Evaluating Gas Motion Differences Between Dichlorosilane and Trichlorosilane in Ambient Hydrogen in a Slim Vertical Cold Wall Chemical Vapor Deposition Reactor
    Research 2020 : October - December
    Mana Otani, Toshinori Takahashi, Hitoshi Habuka, Yuuki Ishida, Shin-Ichi Ikeda, Shiro Hara

    A dichlorosilane gas and a trichlorosilane gas in ambient hydrogen were evaluated\nto show their different gas flow motions in a slim vertical cold wall\nchemical vapor deposition reactor for the Minimal Fab system. This evaluation\nwas performed for improving and controlling the film qualities and the\nproductivities, using two quartz crystal microbalances (QCM) installed at the\ninlet and exhaust of the chamber by taking into account that the QCM frequency\ncorresponds to the real time changes in the gas properties. Typically,\nthe time period approaching from the inlet to the exhaust was shorter for the\ntrichlorosilane gas than that for the dichlorosilane gas. The trichlorosilane gas\nwas shown to move like plug flow, while the dichlorosilane gas seemed to be\nwell mixed in the entire chamber.

    How to Cite this Article
    Attribution/ CC Compliant Citation:Otani, Mana, et al. \"Quartz Crystal Microbalances\nfor Evaluating Gas Motion Differences between Dichlorosilane and Trichlorosilane in\nAmbient Hydrogen in a Slim Vertical Cold Wall Chemical Vapor Deposition Reactor.\"\nAdvances in Chemical Engineering and Science 10.3 (2020): 190-200.\nhttps://doi.org/10.4236/aces.2020.103014\nhttp://creativecommons.org/licenses/by/4.0/\nSome formatting elements, header, footer, logos, dates and pagination were modified\nwhile adapting this article.
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